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ARTICLE
Year : 2012  |  Volume : 58  |  Issue : 3  |  Page : 197-204

Complex 2D Electric Field Solution in Undoped Double-gate MOSFETs


1 Technische Hochschule Mittelhessen, Competence Center for Nanotechnology and Photonics, Wiesenstrasse 14, Giessen 35390, Germany; Universitat Rovira i Virgili, Department d'Enginyeria Electronica, Elèctrica i Automàtica, Avda. Païson Catalans, 26., Campus Sescelades, Tarragona 43007, Spain,
2 Technische Hochschule Mittelhessen, Competence Center for Nanotechnology and Photonics, Wiesenstrasse 14, Giessen 35390, Germany,
3 Universitat Rovira i Virgili, Department d'Enginyeria Electronica, Elèctrica i Automàtica, Avda. Païson Catalans, 26., Campus Sescelades, Tarragona 43007, Spain,

Correspondence Address:
Mike Schwarz
Technische Hochschule Mittelhessen, Competence Center for Nanotechnology and Photonics, Wiesenstrasse 14, Giessen 35390, Germany; Universitat Rovira i Virgili, Department d'Enginyeria Electronica, Elèctrica i Automàtica, Avda. Païson Catalans, 26., Campus Sescelades, Tarragona 43007, Spain

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DOI: 10.4103/0377-2063.97326

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A new technique to calculate the channel electric field in Double-gate MOSFETs and Schottky barrier Double-gate MOSFETs (SB-DG-MOSFETs) in sub-threshold region is presented. 2D Poisson΄s equation is solved in an analytical closed form with the conformal mapping technique. The estimated solution of the two-dimensional electric field with its complex components is analyzed with the bias conditions for accumulation and inversion regions, which have been applied and studied in detail. A comparison with data simulated by 2D TCAD Sentaurus simulator for channel lengths down to 22 nm was made and is in a good agreement to this simulation results.


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